Development and Characterization of a Self-Cleaning Shallow Trench Etch Process for Robust 0.35 um and below Manufacturing Environments
- Author(s):
- Publication title:
- Proceedings of the twelfth International Symposium on Plasma Processing
- Title of ser.:
- Electrochemical Society Proceedings Series
- Ser. no.:
- 98-4
- Pub. Year:
- 1998
- Page(from):
- 210
- Page(to):
- 221
- Pub. info.:
- Pennington, NJ: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566771986 [1566771986]
- Language:
- English
- Call no.:
- E23400/98-4
- Type:
- Conference Proceedings
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