1.

Conference Proceedings
Conference Proceedings
1. Anti-bubble topcoat for immersion lithography
Paulsson, A. ; Xing, K. ; Fosshaug, H. ; Lundvall, A. ; Bjornberg, C. ; Karlsson, J.
Pub. info.: Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA.  pp.527-536,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5753(1)
2.

Conference Proceedings
Conference Proceedings
2. Some aspects on mechanisms responsible for contamination of optical components in DUV lithographic exposure tools
Fosshaug, H. ; Ekberg, M. ; Kylberg, G.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.1601-1628,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
3.

Conference Proceedings
Conference Proceedings
3. FEP-171 resist thickness optimization and dry etch screening on NTAR7 chrome substrates for Sigma7300 DUV laser pattern generator
Karlsson, J. O. ; Xing, K. ; Bajramovic, A. ; Dahlberg, H. ; Bjornberg, C. ; Hogfeldt, P. ; Kjellberg, L. ; Fosshaug, H. ; Dahlberg, A. ; Lundvall, A.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.234-244,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567
4.

Conference Proceedings
Conference Proceedings
4. Reducing process contributions to CD error range the Sigma7500 pattern generator and ProcessEqualizer [6283-13]
Hellgren, J. ; Fosshaug, H. ; osterberg, A. ; Ivansen, L.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XIII.  pp.62831I-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6283
5.

Conference Proceedings
Conference Proceedings
5. Laser PG performance for 100-nm photomasks
Rosling, M. ; Karawajczyk, A. ; Askebjer, P. ; Zerne, R. ; Carroll, A.M. ; Eklund, R. ; Fosshaug, H. ; Sandstrom, T.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part Two  pp.759-766,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
6.

Conference Proceedings
Conference Proceedings
6. Characterization of 193-nm resists for optical mask manufacturing
Fosshaug, H. ; Paulsson, A. ; Berzinsh, U. ; Magnusson, H.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.1256-1267,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567
7.

Conference Proceedings
Conference Proceedings
7. Influence of writing strategy on CD control for the spatial-light-modulator-based Sigma7300 DUV laser pattern generator
Fosshaug, H. ; Askebjer, P. ; Karlsson, J. ; Bajramovic, A. ; Xing, K. ; Eklund, R. ; Walford, J. ; Ekberg, M. ; Hogfeldt, P. ; ystrym, T.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.879-894,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376