1.

Conference Proceedings
Conference Proceedings
1. PECULIARITIES OF HOT PHOSPHORIC ACID USED IN ETCHING SILICON NITRIDE
Syverson, W. ; Fleming, M.
Pub. info.: Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.78-84,  1994.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 1994-7
2.

Conference Proceedings
Conference Proceedings
2. THE EFFECTS OF REVERSING WAFER-SURFACE WETTING PROPERTIES OF SULFURIC ACID:HYDROGEN PEROXIDE WAFER-CLEANING SOLUTIONS
Syverson, W. ; Fleming, M. ; Schubring, P.
Pub. info.: Proceedings of the Fourth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.60-65,  1995.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 95-20