1.

Conference Proceedings
Conference Proceedings
1. 0.11-μm imaging in KrF lithography using dipole illumination
Eurlings,M. ; Setten,E.van ; Torres,J.A. ; Dusa,M.V. ; Socha,R.J. ; Capodieci,L. ; Finders,J.
Pub. info.: Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK.  pp.266-278,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4404
2.

Conference Proceedings
Conference Proceedings
2. KrF lithography for 130 nm
Finders,J. ; Schoot,J.B.van ; Vanoppen,P. ; Dusa,M.V. ; Socha,R.J. ; Vandenberghe,G. ; Ronse,K.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part1  pp.192-205,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
3.

Conference Proceedings
Conference Proceedings
3. Forbidden pitches for 130-nm lithography and below
Socha,R.J. ; Dusa,M.V. ; Capodieci,L. ; Finders,J. ; Chen,J.F. ; Flagello,D.G. ; Cummings,K.D.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part2  pp.1140-1155,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
4.

Conference Proceedings
Conference Proceedings
4. Low-k1 imaging: how low can we go?
Finders,J. ; Eurlings,M. ; Schenau,K.Van Ingen ; Dusa,M.V. ; Jenkins,P.
Pub. info.: Microlithographic Techniques in Integrated Circuit Fabrication II.  pp.1-15,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4226
5.

Conference Proceedings
Conference Proceedings
5. Printing 130-nm DRAM isolation pattern: Zernike correlation and tool improvement
Schoot,J.B.van ; Seong,N. ; Geh,B. ; Burkhardt,M. ; Graupner,P. ; Reisinger,G. ; Rubingh,R. ; Suddendorf,M. ; Finders,J. ; Rikkers,E.
Pub. info.: Optical Microlithography XIV.  4346  pp.229-240,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
6.

Conference Proceedings
Conference Proceedings
6. ArF step-and-scan system with 0.75 NA for the 0.10-μm node
Vleeming,B. ; Heskamp,B. ; Bakker,H. ; Verstappen,L. ; Finders,J. ; Stoeten,J. ; Borret,R. ; Roempp,O.
Pub. info.: Optical Microlithography XIV.  4346  pp.634-650,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
7.

Conference Proceedings
Conference Proceedings
7. Can DUV take us below 100 nm?
Finders,J. ; Jorritsma,L. ; Eurlings,M. ; Moerman,R. ; Greevenbroek,H.van ; Schoot,J.B.van ; Flagello,D.G. ; Socha,R.J. ; Stammler,T.
Pub. info.: Optical Microlithography XIV.  4346  pp.153-165,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
8.

Conference Proceedings
Conference Proceedings
8. Perfect photoresist for 157-nm imaging
Conley,W. ; Byers,J.D. ; Dean,K.R. ; Hansen,S.G. ; Finders,J. ; Sinkwitz,S.
Pub. info.: Advances in Resist Technology and Processing XVIII.  4345  pp.344-349,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4345