1.

Conference Proceedings
Conference Proceedings
1. Matching simulation and experiment for chemically amplified resists
Mack,C.A. ; Ercken,M. ; Moelants,M.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part1  pp.183-192,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
2.

Conference Proceedings
Conference Proceedings
2. Variable-threshold resist models for lithography simulation
Randall,J. ; Ronse,K. ; Marschner,T. ; Goethals,M. ; Ercken,M.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part1  pp.176-182,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679