1.

Conference Proceedings
Conference Proceedings
1. Status 157-nm lithography development at IMEC
Ronse, K.G. ; Bisschop, P.D. ; Eliat, A. ; Goethals, A.M. ; Hermans, J. ; Jonckheere, R. ; Heuvel, D.V.D. ; Roey, F.V. ; Beckx, S. ; Wouters, J.M. ; Marneffe, J.F. ; O'Neil, T. ; Tirri, B. ; Sewell, H.
Pub. info.: Optical Microlithography XVI.  Part One  pp.640-649,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
2.

Conference Proceedings
Conference Proceedings
2. Experimental investigation of fabrication process-, transportation-, storage, and handling-induced contamination of 157-nm reticles and vacuum UV cleaning
Okoroanyanwu, U. ; Stepanenko, N. ; Vereecke, G. ; Eliat, A. ; Kocsis, M.K. ; Kang, Y.S. ; Jonckheere, R.M. ; Conard, T. ; Ronse, K.G.
Pub. info.: Optical Microlithography XVII.  pp.487-503,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377