1.

Conference Proceedings
Conference Proceedings
1. HIGH DEFINITION MESA GROWTH BY SILICON MBE
Hammerl, E. ; Wittmann, F. ; Messarosch, J. ; Eisele, I. ; Huber, V. ; Oppolzer, H.
Pub. info.: Silicon molecular beam epitaxy : symposium held April 29-May 3, 1991, Anaheim, California, U.S.A..  pp.27-34,  1991.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 220
2.

Conference Proceedings
Conference Proceedings
2. Electrical Properties of BaTiO3 Thin Films Flash-Evaporated on Si and SiO2/Si
Cabellero, J. V. ; Avila, R. E. ; Fuenzalida, V. M. ; Eisele, I.
Pub. info.: Amorphous and crystalline insulating thin films--1996 : symposium held December 2-4, 1996, Boston, Massachusetts, U.S.A..  pp.355-,  1997.  Pittsburgh, Pa..  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 446
3.

Conference Proceedings
Conference Proceedings
3. FACET FORMATION OF LINESHAPED SILICON MESAS GROWN WITH MICRO SHADOW MASKS
Gossner, H. ; Fehlauer, G. ; Kiunke, W. ; Eisele, I. ; Stolz, M. ; Hintermaier, M. ; Knapek, E.
Pub. info.: Molecularly designed ultrafine/nanostructured materials : symposium held April 4-8, 1994, San Francisco, California, U.S.A..  pp.393-,  1994.  Pittsburgh, Pa..  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 351
4.

Conference Proceedings
Conference Proceedings
4. SIMULATION OF BURIED LAYER EXPERIMENTS CONTAIN- ING ALL FOUR DOPANT SPECIES
Ghaderi, K. ; Hobler, G. ; Budil, M. ; Poetzl, H. ; Pichler, P. ; Ryssel, H. ; Hansch, W. ; Eisele, I. ; Tian, C. ; Stingeder, G.
Pub. info.: Proceedings of the Seventh International Symposium on Silicon Materials Science and Technology.  pp.613-624,  1994.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 1994-10
5.

Conference Proceedings
Conference Proceedings
5. Device Quality of Hydrogen Plasma Cleaning for Silicon Molecular Beam Epitaxy
Hansch, W. ; Eisele, I. ; Kibbel, H. ; Konig, U.
Pub. info.: Ultraclean semiconductor processing technology and surface chemical cleaning and passivation : Symposum held April 17-19, 1995, San Francisco, California, USA.  pp.345-,  1995.  Pittsburgh, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 386
6.

Conference Proceedings
Conference Proceedings
6. Materials Compatibility between Si/SiO2 Substrates and BaTiO3 Thin Films
Caballero, J. V. ; Fuenzalida, V. M. ; Avila, R. ; Eisele, I.
Pub. info.: Polycrystalline thin films II : structure, properties, and applications : symposium held November 27-December 1, 1995, Boston, Massachusetts, U.S.A..  pp.189-,  1996.  Pittsburgh, Pa..  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 403