Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part1 pp.410-422, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK. pp.56-67, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering