1.

Conference Proceedings
Conference Proceedings
1. Classical Versus First-Principles Structural Relaxation: Calculated Electronic Excitations and Optical Properties of Ge Nanocrystals Embedded in a SiC Matrix
Cappellini, Giancarlo ; Weissker, H. -Ch. ; De-Salvator, D. ; Furthmuller, J. ; Bechstedt, F. ; Satta, G. ; Casula, F. ; Colombo, L.
Pub. info.: Group-IV semiconductor nanostructures : symposium held November 29-December 2, 2004, Boston, Massachusetts, U.S.A..  pp.121-128,  2005.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 832
2.

Conference Proceedings
Conference Proceedings
2. Flicker noise in nitrided high-k dielectric NMOS transistors
Min, B. ; Devireddy, S. P. ; Celik Butler, Z. ; Shanware, A. ; Green, K. ; Chambers, J. J. ; Visokay, M. V. ; Colombo, L. ; Rotondaro, A. L. P.
Pub. info.: Noise in devices and circuits III : 24-26 May, 2005, Austin, Texas, USA.  pp.31-40,  2005.  Bellingham, Washington.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5844
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Conference Proceedings
Conference Proceedings
3. Covalent Cluster-Assembled Carbon Solids
Benedek, G. ; Bernasconi, M. ; Donadio, D. ; Colombo, L.
Pub. info.: Nanostructured Carbon for Advanced Applications.  pp.89-128,  2001.  Dordrecht.  Kluwer Academic Publishers
Title of ser.: NATO science series. Series 2, Mathematics, physics and chemistry
Ser. no.: 24
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Conference Proceedings
Conference Proceedings
4. Interfacial Diffusion Studies of Hf and Zr Into Si from Thermally Annealed Hf and Zr Silicates
Quevedo-Lopez, M.A. ; El-Bouanani, M. ; Gnade, B.E. ; Colombo, L. ; Bevan, M. ; Douglas, M. ; Visokay, M. ; Wallace, R.M.
Pub. info.: Materials issues in novel si-based technology : symposium held November 26-28, 2001, Boston, Massachusetts, U.S.A..  pp.223-228,  2002.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 686
5.

Conference Proceedings
Conference Proceedings
5. EFFECT OF COMPOSITION AND POST-DEPOSITION ANNEALING ON THE ETCH RATE OF HAFNIUM AND ZIRCONIUM SILICATES IN DILUTE HF
Chambers, J.J. ; Rotondaro, A.L. ; Bevan, M.J. ; Visokay, M.R. ; Colombo, L.
Pub. info.: Cleaning technology semiconductor device manufacturing : proceedings of the seventh international symposium.  pp.359-366,  2001.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2001-26
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Conference Proceedings
Conference Proceedings
6. Novel HfSiON Gate Dielectric for Advanced CMOS Devices
Colombo, L. ; Visokay, M.R. ; Chambers, J.J. ; Rotondaro, A.L.P. ; Shanware, A. ; Bevan, M.J. ; Bu, H. ; Tsung, L.
Pub. info.: Rapid thermal and other short-time processing technologies III : proceedings of the international symposium.  pp.199-206,  2002.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2002-11
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Conference Proceedings
Conference Proceedings
7. Comparison Of MOCVD Precursors For Hf1-xSixO2 Gate Dielectric Deposition
Hendrix, B.C. ; Borovik, A.S. ; Wang, Z. ; Xu, C. ; Roeder, J.F. ; Baum, T.H. ; Bevan, M.J. ; Visokay, M.R. ; Chambers, J.J. ; Rotondaro, A.L.P. ; Bu, H. ; Colombo, L.
Pub. info.: Silicon materials - processing characterization and reliability : symposium held April 1-5, 2002, San Francisco, California, U.S.A..  pp.273-278,  2002.  Warrendale.  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 716