1.

Conference Proceedings
Conference Proceedings
1. 9 Structure and thermal evolution of small clusters found after ultralow-energy high-dose boron implantation in Si
Hebras, X. ; Cristiano, F. ; Cherkash, N. ; Lerch, W. ; Paul, S. ; Pawlalr, B. ; Surdeano, R. ; Claverie, A.
Pub. info.: Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium.  pp.67-82,  2003.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-14
2.

Conference Proceedings
Conference Proceedings
2. Strained Silicon on Insulator Wafers Made by the Smart CutTM Technology
Ghyselen, B. ; Bogumilowicz, Y. ; Aulnette, C. ; Abbadie, A. ; Osternaud, B. ; Besson, P. ; Daval, N. ; Andrieu, F. ; Cayrefourq, I. ; Moriceau, H. ; Ernst, T. ; Tiberj, A. ; Rayssac, O. ; Blondeau, B. ; Mazure, C. ; Lagahe-Blanchard, C. ; Pocas, S. ; Cartier, A.-M. ; Hartmann, J.-M. ; Leduc, P. ; Nardo, C.Di ; Lugand, J.-F. ; Fournel, F. ; Semeria, M.-N. ; Kernevez, N. ; Campidelli, Y. ; Kermarrec, O. ; Morand, Y. ; Rivoire, M. ; Bensahel, D. ; Paillard, V. ; Vincent, L. ; Claverie, A. ; Boucaud, P.
Pub. info.: High-mobility group-IV materials and devices : symposium held April 13-15, 2004, San Francisco, California, U.S.A..  pp.83-88,  2004.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 809
3.

Conference Proceedings
Conference Proceedings
3. Role of Silicon and Boron Interstitial Clusters in Transient Enhanced Diffusion
Cowern, N.E.B. ; Mannino, G. ; Roozeboom, F. ; van Berkum, J.G.M ; Colombeau, B. ; Claverie, A.
Pub. info.: Rapid thermal and other short-time processing technologies : proceedings of the international symposium.  pp.61-72,  2000.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2000-9
4.

Conference Proceedings
Conference Proceedings
4. 10 Relation between thermal evolution of interstitial defects and Transient Enhanced Diffusion in silicon
Claverie, A. ; Cristiano, F. ; Colombeau, B. ; Hebras, X. ; Calvo, P. ; Cherkoshin, N. ; Larnrani, Y. ; Scheid, E. ; de Mauduit, B. ; Lampin, E.
Pub. info.: Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium.  pp.73-82,  2003.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-14
5.

Conference Proceedings
Conference Proceedings
5. Annealing Behavior Of Locally Confined Dislocation Loops Under Inert And Oxidizing Ambient
Tsamis, C. ; Skarlatos, D. ; Raptis, I. ; Tsoukalas, D. ; Calvo, P. ; Colombeau, B. ; Cristiano, F. ; Claverie, A.
Pub. info.: Silicon front-end junction formation technologies : symposium held April 2-4, 2002, San Francisco, California, U.S.A..  pp.243-248,  2002.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 717
6.

Conference Proceedings
Conference Proceedings
6. Current Understanding and Modeling of B Diffusion and Activation Anomalies in Preamorphized Ultra-Shallow Junctions
Colombeau, B. ; Smith, A.J. ; Cowern, N.E.B. ; Pawlak, B.J. ; Cristiano, F. ; Duffy, R. ; Claverie, A. ; Ortiz, C.J. ; Pichler, P. ; Lampin, E. ; Zechner, C.
Pub. info.: Silicon front-end junction formation : physics and technology : symposium held April 13-15, 2004, San Francisco, California, U.S.A..  pp.91-102,  2004.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 810
7.

Conference Proceedings
Conference Proceedings
7. On the 'Life' of {113} Defects
Cherkashin, N. ; Calvo, P. ; Cristiano, F. ; Mauduit, B.de ; Claverie, A.
Pub. info.: Silicon front-end junction formation : physics and technology : symposium held April 13-15, 2004, San Francisco, California, U.S.A..  pp.103-108,  2004.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 810
8.

Conference Proceedings
Conference Proceedings
8. Atomistic Simulations of Extrinsic Defects Evolution and Transient Enhanced Diffusion in Silicon
Claverie, A. ; Colombeau, B. ; Cristiano, F. ; Altibelli, A. ; Bonafos, C.
Pub. info.: Si front-end processing -- physics and technology of dopant-defect interactions III : symposium held April 17-19, 2001, San Francisco, California, U.S.A..  2001.  Warrendale, PA.  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 669
9.

Conference Proceedings
Conference Proceedings
9. Atomistic Simulations of the Ostwald Ripening of Si Nanoparticles Ion Beam Synthesized in Sio2
Bonafos, C. ; Carrada, M. ; Colombeau, B. ; Altibelli, A. ; Assayag, G. Ben ; Garrido, B. ; Lopez M. ; Perez-Rodriguez, A. ; Morante, J.R. ; Claverie, A.
Pub. info.: Ion beam synthesis and processing of advanced materials : symposium held November 27-29, 2000, Boston, Massachusetts, U.S.A..  2001.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 647
10.

Conference Proceedings
Conference Proceedings
10. Oxidation of Si nanocrystals fabricated by ultra-low energy ion implantation in thin SiO2 layers
Coffin, H. ; Bonafos, C. ; Schamm, S. ; Cherkashin, N. ; Respaud, M. ; Ben-Assayag, G. ; Dimitrakis, P. ; Normand, P. ; Tence, M. ; Colliex, C. ; Claverie, A.
Pub. info.: Materials and processes for nonvolatile memories : symposium held November 30-December 2, 2004, Boston, Massachusetts, U.S.A..  pp.281-286,  2005.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 830