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Use of deep reactive ion etching in the fabrication of high-efficiency high-resolution crystal x-ray analyzers

Author(s):
Shew, B.-Y. ( Synchrotron Radiation Research Ctr. (Taiwan) )
Huang, R.-S. ( Tsing Hua Univ. (Taiwan) )
Wang, D.-J. ( Synchrotron Radiation Research Ctr. (Taiwan) )
Perng, S.-Y.
Kuan, C.-K.
Cai, Y.Q.
Chow, P.C.
Schwoerer-Boehning, M. ( Argonne National Lab. (USA) )
Caliebe, W. ( Brookhaven National Lab. (USA) )
Kao, C.-C.
Chen, C.T. ( Synchrotron Radiation Research Ctr. (Taiwan) )
6 more
Publication title:
Design and microfabrication of novel x-ray optics : 9 July 2002, Seattle, Wasington, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4783
Pub. Year:
2002
Page(from):
131
Page(to):
138
Pages:
8
Pub. info.:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819445506 [0819445509]
Language:
English
Call no.:
P63600/4783
Type:
Conference Proceedings

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