1.

Conference Proceedings
Conference Proceedings
1. Formation of sequence-specific telomeric DNA loops via direct effects of psoralen-photosensitization on telomeres
Cao,E.-H. ; Chen,A. ; Sun,X. ; Zhang,X. ; Qin,J. ; Liu,D. ; Wang,C. ; Bai,C.
Pub. info.: Biomedical photonics and optoelectronic imaging : 8-10 November 2000, Beijing, China.  pp.45-49,  2000.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4224
2.

Conference Proceedings
Conference Proceedings
2. Measuring particulate concentration by means of scattered light scintillation
Chen,A. ; Hao,J. ; Zhou,Z. ; Ma,Y.
Pub. info.: Process Control and Inspection for Industry.  pp.71-75,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4222
3.

Conference Proceedings
Conference Proceedings
3. RuMBa: a rule-model OPC for low MEEF 130-nm KrF lithography
Hsu,S. ; Shi,X. ; Hsu,M. ; Corcoran,N.P. ; Chen,J.F. ; Desai,S. ; Sherrill,M.J. ; Tseng,Y.C. ; Chang,H.A. ; Kao,J.F. ; Tseng,A. ; Liu,W.J. ; Chen,A. ; Lin,A. ; Kujten,J.P. ; Jacobs,E. ; Verhappen,A.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VIII.  pp.172-185,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4409
4.

Conference Proceedings
Conference Proceedings
4. Impact of attenuated PSM repair for 130-nm polygate lithography process
Shi,X. ; Hsu,S. ; Socha,R.J. ; Chen,J.F. ; Cheng,A. ; Su,C. ; Cheng,J. ; Chen,A. ; Lin,H. ; Wang,D. ; Chen,D. ; Lin,A. ; Conley,W. ; Metzger,D. ; Shi,X. ; Imamura,P.H. ; Sherrill,M.J.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XV.  pp.707-715,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4344