Fusalba, F. ; Cornec, C.Le ; Maury, P. ; Remiat, B. ; Jousseaume, V. ; Haxaire, K. ; Mourier, T. ; Haumesser, P.H ; Maitrejean, S. ; Simon, J. ; Chabli, A. ; Passemard, G. ; Fusalba, F. ; Cornec, C.Le ; Maury, P. ; Remiat, B. ; Jousseaume, V.
Pub. info.:
Thin film materials, processes, and reliability, plasma processing for the 100 nm node and copper interconnects with low-k inter-level dielectric films : proceedings of the international symposium. pp.186-205, 2003. Pennington, N.J.. Electrochemical Society
Philit, G. ; von Aswege, L. ; Madore, M. ; Wolke, K. ; Clech, M.-C. ; Asselin-Degrange, E. ; Chabli, A. ; Louis, D.
Pub. info.:
Cleaning technology in semiconductor device manufacturing VIII : proceedings of the international symposium. pp.356-361, 2003. Pennington, NJ. Electrochemical Society