Kittl, J. A. ; Lauwers, A. ; Pawlak, M. A. ; Demeurisse, C. ; Anil, K. G. ; Veloso, A. ; van Dal, M. J. H. ; Schram, T. ; Brijs, B. ; Kaiser, M. ; Kubicek, S. ; Cunniffe, J. ; Verbeeck, R. ; Vrancken, C. ; Biesemans, S. ; Maex, K.
Pub. info.:
Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium. pp.225-232, 2005. Pennington, NJ. Electrochemical Society
Vandervorst, W. ; Janssens, T. ; Brijs, B. ; Lindsay, R. ; Collart, E.J.H. ; Kirkwood, David A. ; Mathot, G. ; Terwagne, G.
Pub. info.:
Silicon front-end junction formation technologies : symposium held April 2-4, 2002, San Francisco, California, U.S.A.. pp.277-284, 2002. Warrendale, Pa.. Materials Research Society
Elshocht, S.Van ; Brijs, B. ; Caymax, M. ; Conard, T. ; Gendt, S.De ; Kubicek, S. ; Meuris, M. ; Onsia, B. ; Richard, O. ; Teerlinck, I. ; Steenbergen, J.Van ; Zhao, C. ; Heyns, M.
Pub. info.:
High-mobility group-IV materials and devices : symposium held April 13-15, 2004, San Francisco, California, U.S.A.. pp.287-292, 2004. Warrendale, Pa.. Materials Research Society
Vandervorst, W. ; Pawlak, B.J. ; Janssens, T. ; Brijs, B. ; Delhougne, R. ; Caymax, M. ; Loo, R.
Pub. info.:
High-mobility group-IV materials and devices : symposium held April 13-15, 2004, San Francisco, California, U.S.A.. pp.273-280, 2004. Warrendale, Pa.. Materials Research Society
Vandervorst, W. ; Pawlak, B.J. ; Janssens, T. ; Brijs, B. ; Delhougne, R. ; Caymax, M. ; Loo, R.
Pub. info.:
Silicon front-end junction formation : physics and technology : symposium held April 13-15, 2004, San Francisco, California, U.S.A.. pp.415-422, 2004. Warrendale, Pa.. Materials Research Society
Brijs, B. ; Bender, H. ; Huyghebaert, C. ; Janssens, T. ; Vandervorst, W. ; Nakajima, K. ; Kimura, K. ; Bergmaier, A. ; Dollinger, G. ; van den Berg, J.A.
Pub. info.:
Analytical and diagnostic techniques for semiconductor materials, devices, and processes : joint proceedings of the symposia on: ALTECH 2003, Analytical Techniques for Semiconductor Materials and Process Characterization IV, Paris, France and the 202nd Meeting of the Electrochemical Society, Diagnostic Techniques for Semiconductor Materials and Devices VI, Salt Lake City, Utah. pp.50-62, 2003. Pennington, NJ. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Loo, R. ; Meunier-Beillard, P. ; Delhougne, R. ; Koumoto, T. ; Geenen, L. ; Brijs, B. ; Vandervorst, W.
Pub. info.:
Analytical and diagnostic techniques for semiconductor materials, devices, and processes : joint proceedings of the symposia on: ALTECH 2003, Analytical Techniques for Semiconductor Materials and Process Characterization IV, Paris, France and the 202nd Meeting of the Electrochemical Society, Diagnostic Techniques for Semiconductor Materials and Devices VI, Salt Lake City, Utah. pp.329-338, 2003. Pennington, NJ. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Zhao, C. ; Brijs, B. ; Dortu, F. ; DeGendt, S. ; Caymax, M. ; Heyns, M. ; Besling, W. ; Maes, J.W.
Pub. info.:
Analytical and diagnostic techniques for semiconductor materials, devices, and processes : joint proceedings of the symposia on: ALTECH 2003, Analytical Techniques for Semiconductor Materials and Process Characterization IV, Paris, France and the 202nd Meeting of the Electrochemical Society, Diagnostic Techniques for Semiconductor Materials and Devices VI, Salt Lake City, Utah. pp.243-251, 2003. Pennington, NJ. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Bender, H. ; Conard, T. ; Richard, O. ; Brijs, B. ; Petry, J. ; Vandervorst, W. ; Defranoux, C. ; Boher, P. ; Rochat, N. ; Wyon, C. ; Mack, P. ; Wolstenholme, J. ; Vitchev, R. ; Houssiau, L. ; Pireaux, J-J. ; Bergmaier, A. ; Dollinger, G.
Pub. info.:
Analytical and diagnostic techniques for semiconductor materials, devices, and processes : joint proceedings of the symposia on: ALTECH 2003, Analytical Techniques for Semiconductor Materials and Process Characterization IV, Paris, France and the 202nd Meeting of the Electrochemical Society, Diagnostic Techniques for Semiconductor Materials and Devices VI, Salt Lake City, Utah. pp.223-232, 2003. Pennington, NJ. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Satta, A. ; Simoen, E. ; Janssens, T. ; Benedetti, A. ; Clarysse, T. ; De Jaeger, B. ; Geenen, L. ; Brijs, B. ; Meuris, M. ; Vandervorst, W.
Pub. info.:
Crystalline defects and contamination: their impact and control in device manufacturing IV : DECON 2005 : proceedings of the Satellite Symposium to ESSDERC 2005, Grenoble, France. pp.52-60, 2005. Pennington, N.J.. Electrochemical Society