1.

Conference Proceedings
Conference Proceedings
1. Normal Incidence Reflectance: A Robust Tool for In Situ Real-Time Measurement of Growth Rates and Optical Constants of CVD-Grown Semiconductor Thin Films
Breiland, W.G. ; Brennan, T.M. ; Chui, H.C. ; Hammons, B.E. ; Killeen, K.P.
Pub. info.: Proceedings of the Symposium on Process control, Diagnostics, and Modeling in Semiconductor Manufacturing.  pp.261-269,  1995.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 95-2
2.

Conference Proceedings
Conference Proceedings
2. In-Situ Reflectance and Virtual Interface Analysis for Compound Semiconductor Process Control
Breiland, W.G. ; Hong, H.Q. ; Hammons, B.E. ; Klem, J.F.
Pub. info.: Proceedings of the Symposium on Light Emitting Devices for Optoelectronic Applications and the Twenty-Eighth State-of-the-Art Program on Compound Semiconductors.  pp.311-319,  1998.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 98-2
3.

Conference Proceedings
Conference Proceedings
3. Si Atom Density Profiles In a Rotating Disk CVD Reactor
Ho, P. ; Breiland, W.G. ; Coltrin, M.E.
Pub. info.: Proceedings of the Twelfth International Symposium on Chemical Vapor Deposition.  pp.8-12,  1993.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 1993-2
4.

Conference Proceedings
Conference Proceedings
4. Laser Diagnostics and Numerical Modelling of Si Atom Density During CVD from Silane
Coltrin, M.E. ; Ho, P. ; Breiland, W.G.
Pub. info.: AIchE 1994 Annual Meeting : November 13-18 San Francisco Hilton and Towers Hotel, San Francisco, California.  1994.  New York.  American Institute of Chemical Engineers
Title of ser.: AIChE meeting [papers]
Ser. no.: 1994
5.

Conference Proceedings
Conference Proceedings
5. A Model for Low Pressure Chemical Vapor Deposition in Batch Furnaces
Houf, W.G. ; Grcar, J.F. ; Breiland, W.G.
Pub. info.: Proceedings of the Twelfth International Symposium on Chemical Vapor Deposition.  pp.85-95,  1993.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 1993-2
6.

Conference Proceedings
Conference Proceedings
6. In Situ Growth Rate Measurements by Normal-Incidence Reflectance During MOVPE Growth
Hou, H.Q. ; Breiland, W.G. ; Hammons, B.E. ; Chui, H.C.
Pub. info.: Proceedings of the Twenty-fourth State-of-the-Art Program on Compound Semiconductors.  pp.27-35,  1996.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 96-2