1.

Conference Proceedings
Conference Proceedings
1. Overview and status of the Next Generation Lithography Mask Center of Competency
Bouchard,L.
Pub. info.: Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA.  pp.10-18,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3997
2.

Conference Proceedings
Conference Proceedings
2. Next-generation lithography mask development at the NGL-MCOC
Lercel,M.J. ; Racette,K.C. ; Magg,C. ; Lawliss,M. ; Collins,K.W. ; Barrett,M. ; Trybendis,M.J. ; Bouchard,L.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VII.  pp.105-115,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4066