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Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing. pp.523-527, 1997. Pennington, NJ. Electrochemical Society
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Cleaning technology in semiconductor device manufacturing : proceedings of the sixth international symposium. pp.25-29, 1999. Pennington, NJ. Electrochemical Society
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Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing. pp.239-246, 1997. Pennington, NJ. Electrochemical Society
Bellandi, E. ; Alessandri, M. ; Tonti, A. ; Pipia, F. ; Wolke, K. ; Schenkl, M. ; Geomini, M. ; Kwakman, L.F.T.
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Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing. pp.207-212, 1997. Pennington, NJ. Electrochemical Society
Ghidini, G. ; Alessandri, M. ; Clementi, C. ; Drera, D.
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The physics and chemistry of SiO[2] and the Si-SiO[2] interface-3, 1996 : proceedings of the Third International Symposium on the Physics and Chemistry of SiO[2] and the Si-SiO[2] Interface. pp.645-656, 1996. Pennington, NJ. Electrochemical Society