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11 results

Conference Proceedings

1. Novel 193-nm photoresist based on Olefin-containing lactones

Yoon,K.-S. ; Jung,D.-W. ; Lee,S. ; Lee,S.-H. ; Choi,S.-J. ; Woo,S.-G. ; Moon,J.-T.

Pub. info.:	Advances in Resist Technology and Processing XVIII. 4345 pp.688-694, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4345

Conference Proceedings

2. ArF lithography options for 100-nm technologies

Vandenberghe,G.N. ; Kim,Y.-C. ; Delvaux,C. ; Lucas,K.D. ; Choi,S.-J. ; Ercken,M. ; Ronse,K. ; Vleeming,B.

Pub. info.:	Optical Microlithography XIV. 4346 pp.179-190, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4346

Conference Proceedings

3. Design and performance of photoresist materials for ArF lithography

Kim,H.-W. ; Jung,D.-W. ; Lee,S. ; Choi,S.-J. ; Woo,S.-G. ; Kavanagh,R.J. ; Barclay,G.G. ; Blacksmith,R.F. ; Kang,D. ; Pohlers,G. ; Cameron,J.F. ; Mattia,J. ; Caporale,S. ; Penniman,T. ; Joesten,L.A. ; Thackeray,J.W.

Pub. info.:	Advances in Resist Technology and Processing XVIII. 4345 pp.776-783, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4345

Conference Proceedings

4. Development of resists for thermal flow process applicable to mass production

Kang,Y. ; Woo,S.-G. ; Choi,S.-J. ; Moon,J.-T.

Pub. info.:	Advances in Resist Technology and Processing XVIII. 4345 pp.222-231, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4345

Conference Proceedings

5. Optimization of ArF resist for 100-nm node: DOE and fine-tuning of basic platform

Kim,K. ; Wells,G.M. ; Kim,W.D. ; Choi,Y.-J. ; Choi,S.-J. ; Kim,Y.-S. ; Kim,D.-B.

Pub. info.:	Advances in Resist Technology and Processing XVIII. 4345 pp.168-178, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4345

Conference Proceedings

6. Novel high-performance ArF resist for sub-100-nm lithography

Lee,G. ; Koh,C.-W. ; Jung,J.-C. ; Jung,M.-H. ; Kong,K.-K. ; Kim,J.-S. ; Shin,K.-S. ; Choi,S.-J. ; Kim,Y.-S. ; Choi,Y.-J. ; Kim,D.-B.

Pub. info.:	Advances in Resist Technology and Processing XVIII. 4345 pp.150-158, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4345

Conference Proceedings

7. Quantitative description of phenolic polymer dissolution using the concept of gel layer

Choi,S.-J. ; Cho,J.-Y.

Pub. info.:	Advances in Resist Technology and Processing XVIII. 4345 pp.952-962, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4345

Conference Proceedings

8. Improved lithographic performance of 193-nm photoresists based on cycloolefin/maleic anhydride copolymer by employing mixed PAGs

Choi,S.-J. ; Choi,Y.-J. ; Kim,Y.-S. ; Kim,S.-D. ; Kim,D.-B. ; Kim,J.-H. ; Koh,C.-W. ; Lee,G. ; Jung,J.-C. ; Baik,K.-H.

Pub. info.:	Advances in Resist Technology and Processing XVIII. 4345 pp.94-105, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4345

Conference Proceedings

9. Improved lithographic performance for resists based on polymers having a vinyl ether-maleic anhydride (VEMA) backbone

Tanaka,T. ; Choi,S.-J. ; Jung,D.-W. ; Lee,S. ; Lee,S.-H. ; Kang,Y. ; Woo,S.-G. ; Moon,J.-T. ; Kavanagh,R.J. ; Barclay,G.G. ; Orsula,G.W. ; Mattia,J. ; Caporale,S. ; Adams,T.G. ; Tanaka,T. ; Kang,D.

Pub. info.:	Advances in Resist Technology and Processing XVIII. 4345 pp.119-130, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4345

10.

Conference Proceedings

10. Evaluation of various alternating phase shifting mask processes for KrF lithography

Yoon,S.-Y. ; Cha,H.-S. ; Choi,S.-J. ; Jung,S.-M. ; Choi,S.-S. ; Jeong,S.-H.

Pub. info.:	21st Annual BACUS Symposium on Photomask Technology. 4562 pp.1017-1025, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4562

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