Large-Area Deposition Technology of High Purity Organic Thin Film by Gas Flow Deposition, ガスフロー蒸着法による高純度有機薄膜の大面積成膜技術

ガスフロー蒸着法による高純度有機薄膜の大面積成膜技術
Large-Area Deposition Technology of High Purity Organic Thin Film by Gas Flow Deposition

Author(s):

Tomohiko EDURA

Publication title:

真空 : journal of the Vacuum Society of Japan

Pub. Year:

2015

Vol.:

58

Issue:

3

Page(from):

79

Page(to):

85

Pages:

7

Pub. info.:

東京: 真空協会

ISSN:

18822398

Language:

Japanese

Type:

Academic Journal

Details

TDL ID:	ZA00066506
Note for article:	小特集:真空プロセスで創る有機デバイス研究・開発の最前線. 解説

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ガスフロー蒸着法による高純度有機薄膜の大面積成膜技術Large-Area Deposition Technology of High Purity Organic Thin Film by Gas Flow Deposition

Similar Items:

ガスフロー蒸着法による高純度有機薄膜の大面積成膜技術
Large-Area Deposition Technology of High Purity Organic Thin Film by Gas Flow Deposition