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Defect printability and inspectability of Cr-less phase-shift masks for the 70nm node

Author(s):
J. Heumann
J. Schramm
A. Birnstein
K.T. Park
T. Witte
N. Morgana
M. Hennig
R. Pforr
J. Thiele
N. Schmidt
C. Aquino
6 more
Publication title:
Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5754
Pub. Year:
2005
Pt.:
2
Page(from):
1022
Page(to):
1028
Pages:
7
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457349 [0819457345]
Language:
English
Call no.:
P63600/5754
Type:
Conference Proceedings

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