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65nm node gate pattern using attenuated phase shift mask with off-axis illumination and sub-resolution assist features

Author(s):
Gary Zhang
Mark Terry
Sean O'Brien
Robert Soper
Mark Mason
Won Kim
Changan Wang
Steven Hansen
Jason Lee
Joe Ganeshan
5 more
Publication title:
Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5754
Pub. Year:
2005
Pt.:
2
Page(from):
760
Page(to):
772
Pages:
13
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457349 [0819457345]
Language:
English
Call no.:
P63600/5754
Type:
Conference Proceedings

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