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Managing effects in CD control from PED and PEB in advanced DUV photomask manufacturing using FEP-171 resist

Author(s):
Adisa Paulsson
Kezhao Xing
Hans Fosshaug
Axel Lundvall
Charles Bjoernberg
Johan Karlsson
1 more
Publication title:
Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5753(2)
Pub. date:
2005
Pt.:
2
Page(from):
1119
Page(to):
1128
Pages:
10
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457332 [0819457337]
Language:
English
Call no.:
P63600/5753-2
Type:
Conference Proceedings

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