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Studies on leaching of photoresist components by water

Author(s):
Seung Keun Oh
Jong Yong Kim
Young Ho Jung
Jae Woo Lee
Deog Bae Kim
Jaehyun Kim
Geun Su Lee
Sung Koo Lee
Keun Do Ban
Jae Chang Jung
Cheol Kyu Bok
Seung Chan Moon
7 more
Publication title:
Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5753(2)
Pub. Year:
2005
Pt.:
2
Page(from):
790
Page(to):
798
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457332 [0819457337]
Language:
English
Call no.:
P63600/5753-2
Type:
Conference Proceedings

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