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Development of electron beam resists based on amorphous polyphenols with low molecular weight and narrow dispersion

Author(s):
Taku Hirayama
Daiju Shiono
Shogo Matsumaru
Toshiyuki Ogata
Hideo Hada
Junichi Onodera
Tadashi Arai
Toshio Sakamizu
Atsuko Yamaguchi
Hiroshi Shiraishi
Hiroshi Fukuda
Mitsuru Ueda
7 more
Publication title:
Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5753(2)
Pub. Year:
2005
Pt.:
2
Page(from):
738
Page(to):
745
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457332 [0819457337]
Language:
English
Call no.:
P63600/5753-2
Type:
Conference Proceedings

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