Optimization of a 193-nm silylation process for sub-0.25-µm lithography
- Author(s):
- Publication title:
- Advances in resist technology and processing XII : 20-22 February 1995, Santa Clara, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 2438
- Pub. Year:
- 1995
- Pt.:
- 1
- Page(from):
- 455
- Page(to):
- 464
- Pages:
- 10
- Pub. info.:
- Bellingham, WA: Society of Photo-optical Instrumentation Engineers
- ISSN:
- 0277786X
- ISBN:
- 9780819417862 [0819417866]
- Language:
- English
- Call no.:
- P63600/2438
- Type:
- Conference Proceedings
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12
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Process optimization of a positive-tone chemically amplified resist for 0.25-µm lithography using a vector scan e-beam tool
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