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Evaluation of chemically amplified resist based on adamantyl methacrylate for 193-nm lithography

Author(s):
Publication title:
Advances in resist technology and processing XII : 20-22 February 1995, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
2438
Pub. Year:
1995
Pt.:
1
Page(from):
422
Page(to):
432
Pages:
11
Pub. info.:
Bellingham, WA: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819417862 [0819417866]
Language:
English
Call no.:
P63600/2438
Type:
Conference Proceedings

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