Characterization and modeling of a positive-acting chemically amplified resist
- Author(s):
- Publication title:
- Advances in resist technology and processing XII : 20-22 February 1995, Santa Clara, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 2438
- Pub. Year:
- 1995
- Pt.:
- 1
- Page(from):
- 153
- Page(to):
- 166
- Pages:
- 14
- Pub. info.:
- Bellingham, WA: Society of Photo-optical Instrumentation Engineers
- ISSN:
- 0277786X
- ISBN:
- 9780819417862 [0819417866]
- Language:
- English
- Call no.:
- P63600/2438
- Type:
- Conference Proceedings
Similar Items:
Society of Photo-optical Instrumentation Engineers |
SPIE-The International Society for Optical Engineering |
2
Conference Proceedings
Modeling the impact of thermal history during post-exposure bake on the lithographic performance of chemically amplified resists
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
3
Conference Proceedings
Examination of isolated and grouped feature bias in positive-acting chemically amplified resist systems
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
4
Conference Proceedings
Lithographic and chemical contrast of single-component top-surface imaging (TSI) resists
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
5
Conference Proceedings
Photoacid generator study for chemically amplified negative resists for high-resolution lithography
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |