Blank Cover Image

Quantitative analysis of chemically amplified negative photoresist using mirror-backed infrared reflection absorption spectroscopy

Author(s):
Publication title:
Advances in resist technology and processing XII : 20-22 February 1995, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
2438
Pub. Year:
1995
Pt.:
1
Page(from):
143
Page(to):
152
Pages:
10
Pub. info.:
Bellingham, WA: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819417862 [0819417866]
Language:
English
Call no.:
P63600/2438
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Photoacid generator study for chemically amplified negative resists for high-resolution lithography

Dentinger,P.M., Knapp,K.G., Reynolds,G.W., Taylor,J.W., Fedynyshyn,T.H., Richardson,T.A.

SPIE-The International Society for Optical Engineering
7 Conference Proceedings Characterization of a positive chemically amplified photoresist for process control

Jakatdar,N.H., Niu,X., Spanos,C.J., Romano,A.R., Bendik,J.J., Kovacs,R.P., Hill,S.L.

SPIE-The International Society for Optical Engineering
2 Conference Proceedings Evaluation of photoacid generators in chemically amplified resists for x-ray lithography using an on-wafer photoacid determination technique

Lu,B., Dentinger,P.M., Taylor,J.W., Feke,G.D., Hessman,D., Wu,Q., Grober,R.D.

SPIE - The International Society for Optical Engineering
8 Conference Proceedings Exploration of chemically amplified resist mechanisms and performance at small linewidths

Taylor, James W., Dentinger, Paul M., Rhyner, Steven J., Reynolds, Geoffrey W.

American Chemical Society
3 Conference Proceedings Importance of chemistry at the resist-wafer interface for mechanical and lithographic adhesion

Dentinger,P.M., Taylor,J.W.

SPIE-The International Society for Optical Engineering
9 Conference Proceedings Photoresist film thickness for extreme ultraviolet lithography

Dentinger,P.M., Cardinale,G.F., Henderson,C.C., Fisher,A., Ray-Chaudhuri,A.K.

SPIE - The International Society for Optical Engineering
4 Conference Proceedings Effect of processing on surface roughness for a negative-tone chemically amplified resist exposed by x-ray lithography

Reynolds,G.W., Taylor,J.W.

SPIE-The International Society for Optical Engineering
10 Conference Proceedings Acid mobility in chemically amplified photoresists

Stewart, M.D., Becker, D.J., Stachowiak, T.B., Schmid, G.M., Michaelson, T.B., Tran, H.V., Willson, C.G.

SPIE-The International Society for Optical Engineering
5 Conference Proceedings Lithographic performance of an environmentally stable chemically amplified photoresist(ESCAP)

Conley,W.E., Breyta,G., Brunsvold,W.R., DiPietro,R.A., Hofer,D.C., Holmes,S.J., Ito,H., Nunes,R., Fichtl,G., Hagerty,P., …

SPIE-The International Society for Optical Engineering
11 Conference Proceedings Reflection absorption infrared spectroscopy at low temperatures

Brown A. W., Gardner P.

Kluwer Academic Publishers
6 Conference Proceedings Acid diffusion in a chemically amplified negative i-line photoresist

Connolly,J., Chen,K.R., Kwong,R.W., Lawson,M., Linehan,L.L., Moreau,W.M.

SPIE-The International Society for Optical Engineering
12 Conference Proceedings Quantitative infrared spectra of vapor phase chemical agents

Sharpe, S.W., Johnson, T.J., Chu, P.M., Kleimeyer, J., Rowland, B.

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12