Low-energy focused ion-beam system combined with molecular-beam epitaxy system for fabrication of 3D buried semiconductor structures

Low-energy focused ion-beam system combined with molecular-beam epitaxy system for fabrication of 3D buried semiconductor structures

Author(s):

Publication title:

Electron-beam sources and charged-particle optics : 10-14 July 1995, San Diego, California

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

2522

Pub. Year:

1996

Page(from):

406

Page(to):

411

Pages:

6

Pub. info.:

Bellingham, WA: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819418814 [0819418811]

Language:

English

Call no.:

P63600/2522

Type:

Conference Proceedings

Details

TDL ID:	ZA00057724
Series ID:	PA00000029
Conf. info. (Name):	Symposium on electron-beam sources and charged-particle optics
Conf. info. (Number):	1995
Conf. info. (Venue):	San Diego, CA, USA
Conf. info. (Date):	1995.07.10-1995.07.14
Note for article:	1995 Symposium on electron-beam sources and charged-particle optics, July 10-14, 1995, San Diego, CA, USA. 2522-42

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