Blank Cover Image

Negative electron affinity photocathodes as high-performance electron sources. Part 1: achievement of ultrahigh brightness from an NEA photocathode

Author(s):
Publication title:
Electron-beam sources and charged-particle optics : 10-14 July 1995, San Diego, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
2522
Pub. Year:
1996
Page(from):
208
Page(to):
219
Pages:
12
Pub. info.:
Bellingham, WA: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819418814 [0819418811]
Language:
English
Call no.:
P63600/2522
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Negative electron affinity photocathodes as high-performance electron sources-Part 2: Energy spectrum measurements

A.W. Baum, W.E. Spicer, R.F.W. Pease, K.A. Costello, V.W. Aebi

Society of Photo-optical Instrumentation Engineers
7 Conference Proceedings Evaluation system of negative electron affinity photocathode

Fu, R., Chang, B., Qian, Y., Wang, G., Zong, Z.

SPIE-The International Society for Optical Engineering
2 Conference Proceedings Transferred electron photocathode with greater than 20% quantum efficiency beyond 1 micron

K.A. Costello, V.W. Aebi, G.A. Davis, R.A. La Rue, R.E. Weiss

Society of Photo-optical Instrumentation Engineers
8 Conference Proceedings Global space charge effects in high-throughput electron-beam lithography

Han,L., Meisburger,W.D., Pease,R.F.W., Winograd,G.I.

SPIE - The International Society for Optical Engineering
3 Conference Proceedings Escape probability for negative electron affinity photocathodes: calculations compared to experiments

G. Vergara, A. Herrera-Gómez, W.E. Spicer

Society of Photo-optical Instrumentation Engineers
9 Conference Proceedings Spectral response and surface layer thickness of GaAs:Cs-O negative electron affinity photocathode

Chang, B., Liu, W., Fu, R., Qian, Y., Zong, Z., Wang, G.

SPIE-The International Society for Optical Engineering
4 Conference Proceedings Electron-bombarded back-illuminated CCD sensors for low-light-level imaging applications

G.M. Williams, Jr., A.L. Rheinheimer, V.W. Aebi, K.A. Costello

Society of Photo-optical Instrumentation Engineers
10 Conference Proceedings Resist charging in electron-beam lithography

Bai,M., Picard,D.S., Tanasa,C., McCord,M.A., Berglund,C.N., Pease,R.F.W

SPIE - The International Society for Optical Engineering
5 Conference Proceedings Performance limitations from Coulomb interaction in maskless parallel electron-beam lithography systems

Han,L., McCord,M.A., Winograd,G.I., Pease,R.F.W.

SPIE-The International Society for Optical Engineering
11 Conference Proceedings High-accuracy alignment based on subspace decomposition

Ghazanfarian,A.A., Chen,X., McCord,M.A., Pease,R.F.W.

SPIE-The International Society for Optical Engineering
6 Conference Proceedings Resist charging in electron-beam lithography

Liu,W., Pease,R.F.W.

SPIE-The International Society for Optical Engineering
12 Conference Proceedings High-speed mapping of intertransistor overlay variations using active electrical metrology

Ouyang,X., Berglund,C.N., Pease,R.F.W.

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12