Preliminary methodology investigation of mask pattern fidelity for 250-nm design rules

Preliminary methodology investigation of mask pattern fidelity for 250-nm design rules

Author(s):

Publication title:

Photomask and X-ray mask technology II : 20-21 April 1995, Kawasaki City, Kanagawa, Japan

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

2512

Pub. Year:

1995

Page(from):

523

Page(to):

536

Pages:

14

Pub. info.:

Bellingham, WA: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819418708 [0819418706]

Language:

English

Call no.:

P63600/2512

Type:

Conference Proceedings

Details

TDL ID:	ZA00057714
Series ID:	PA00000029
Conf. info. (Name):	Symposium on photomask and X-ray mask technology
Conf. info. (Number):	2nd
Conf. info. (Venue):	Kawasaki, Japan
Conf. info. (Date):	1995.04.20-1995.04.21
Note for article:	2nd Symposium on photomask and X-ray mask technology, April 20-21, 1995, Kawasaki, Japan. 2512-59

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