Die-to-database defect detection for reticles of 64- and 256-Mbit DRAMs
- Author(s):
- Publication title:
- Photomask and X-ray mask technology II : 20-21 April 1995, Kawasaki City, Kanagawa, Japan
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 2512
- Pub. Year:
- 1995
- Page(from):
- 453
- Page(to):
- 456
- Pages:
- 4
- Pub. info.:
- Bellingham, WA: Society of Photo-optical Instrumentation Engineers
- ISSN:
- 0277786X
- ISBN:
- 9780819418708 [0819418706]
- Language:
- English
- Call no.:
- P63600/2512
- Type:
- Conference Proceedings
Similar Items:
SPIE-The International Society for Optical Engineering |
7
Conference Proceedings
Further work in optimizing PBS:is it capable of meeting specifications for 256-Mbit-DRAM reticle manufacturing?
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
8
Conference Proceedings
Detectability and printability of programmed defect reticle for 256-Mb dram
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
4
Conference Proceedings
Use of line-width error detection for quality control in reticle fabrication
SPIE-The International Society for Optical Engineering |
10
Conference Proceedings
Electrical characterization of across-field lithographic performance for 256-Mbit DRAM technologies
Society of Photo-optical Instrumentation Engineers |
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
6
Conference Proceedings
Real-time line-width measurements: a new feature for reticle inspection systems
SPIE-The International Society for Optical Engineering |
12
Conference Proceedings
Detectability and printability of programmed defects in the contact layer for 256-Mb-DRAM grade reticle
SPIE-The International Society for Optical Engineering |