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Sub-0.1-µm ArF excimer laser lithography with alternating phase-shifting masks

Author(s):
Publication title:
Photomask and X-ray mask technology II : 20-21 April 1995, Kawasaki City, Kanagawa, Japan
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
2512
Pub. Year:
1995
Page(from):
367
Page(to):
371
Pages:
5
Pub. info.:
Bellingham, WA: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819418708 [0819418706]
Language:
English
Call no.:
P63600/2512
Type:
Conference Proceedings

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