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Effect of resist surface insoluble layer in attenuated phase-shift mask for window pattern formation

Author(s):
Publication title:
Optical/laser microlithography VIII : 22-24 February, 1995, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
2440
Pub. Year:
1995
Page(from):
804
Page(to):
815
Pages:
12
Pub. info.:
Bellingham, WA: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819417886 [0819417882]
Language:
English
Call no.:
P63600/2440
Type:
Conference Proceedings

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