Efficient 3D phase-shifting mask lithography simulation

Efficient 3D phase-shifting mask lithography simulation

Author(s):

Publication title:

Optical/laser microlithography VIII : 22-24 February, 1995, Santa Clara, California

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

2440

Pub. Year:

1995

Page(from):

422

Page(to):

434

Pages:

13

Pub. info.:

Bellingham, WA: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819417886 [0819417882]

Language:

English

Call no.:

P63600/2440

Type:

Conference Proceedings

Details

TDL ID:	ZA00057643
Series ID:	PA00000029
Conf. info. (Name):	Symposium on optical/laser microlithography
Conf. info. (Number):	8th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	1995.02.22-1995.02.24
Note for article:	8th Symposium on optical/laser microlithography, February 22-24, 1995, Santa Clara, CA, USA. 2440-36

Similar Items:

1 Conference Proceedings Efficient workstation-based 3D model for optical alignment simulation Lucas,K.D., Yuan,C.-M., Strojwas,A.J. SPIE-The International Society for Optical Engineering	7 Conference Proceedings Sub-0.1-µm ArF excimer laser lithography with alternating phase-shifting masks J. Ushioda, Y. Seki, H. Tanabe, Y. Ogura, K. Maeda Society of Photo-optical Instrumentation Engineers
2 Conference Proceedings Lithography simulation of contamination-caused defects C.E. Novak, K.D. Lucas, A.J. Strojwas, Z.-M. Ling Society of Photo-optical Instrumentation Engineers	8 Conference Proceedings A superfast 3D lithography simulator and its application for ULSI printability analysis Zhu, Z., Strojwas, A.J. SPIE - The International Society of Optical Engineering
3 Conference Proceedings METROPOLE-3D: a three-dimensional electromagnetic field simulator for EUV masks under oblique illumination Zhu, Z., Lucas, K.D., Cobb, J.L., Hector, S.D., Strojwas, A.J. SPIE - The International Society of Optical Engineering	9 Conference Proceedings Optical proximity correction of alternating phase-shift masks for 0.18-ｦﾌm KrF lithography Yasuzato,T., Ishida,S., Shioiri,S., Tanabe,H., Kasama,K. SPIE-The International Society for Optical Engineering
4 Conference Proceedings Metropole-3D: a rigorous 3D topography simulator Li,X., Lucas,K.D., Swecker,A.L., Strojwas,A.J. SPIE-The International Society for Optical Engineering	10 Conference Proceedings Comparisons of 9% versus 6% transmission attenuated phase-shift mask for the 65-nm device mode Montgomery, P.K., Lucas, K.D., Litt, L.C., Conley, W., Fanucchi, E., Van Wingerden, J., Vandenberghe, G., Wiaux, V., … SPIE - The International Society of Optical Engineering
5 Conference Proceedings Propagation of EM waves in axial symmetric structures and its implication for 3D rigorous lithography process simulation Zhu, Z., Strojwas, A.J. SPIE - The International Society of Optical Engineering	11 Conference Proceedings Simulation and characterization of silicon oxynitrofluoride films as a phase-shift mask material for 157-nm optical lithography Kim, S., Choi, E., Kim, H., Kim, J., No, K. SPIE-The International Society for Optical Engineering
6 Conference Proceedings Rigorous EUV mask simulator using 2D and 3D waveguide methods Zhu, Z., Lucas, K., Cobb, J.L., Hector, S.D., Strojwas, A.J. SPIE-The International Society for Optical Engineering	12 Conference Proceedings Application of an effective wavelet matrix transform approach for optical lithography simulation:analysis of topological effects of phase-shifting masks Lee,S.G., Kim,H.-J., Lee,D.-H., Lee,J.-U. SPIE - The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12