Methodology for reducing process variability through in-situ production of positive photoresist developer

Methodology for reducing process variability through in-situ production of positive photoresist developer

Author(s):

Publication title:

Integrated circuit metrology, inspection, and process control IX : 20-22 February 1995, Santa Clara, California

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

2439

Pub. Year:

1995

Page(from):

506

Page(to):

511

Pages:

6

Pub. info.:

Bellingham, WA: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819417879 [0819417874]

Language:

English

Call no.:

P63600/2439

Type:

Conference Proceedings

Details

TDL ID:	ZA00057642
Series ID:	PA00000029
Conf. info. (Name):	Symposium on integrated circuit metrology, inspection, and process control
Conf. info. (Number):	9th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	1995.02.20-1995.02.22
Note for article:	9th Symposium on integrated circuit metrology, inspection, and process control, February 20-22, 1995, Santa Clara, CA, USA. 2439-54

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