New CD-SEM technology for 0.25-µm production

New CD-SEM technology for 0.25-µm production

Author(s):: S.R. Rogers
Publication title:: Integrated circuit metrology, inspection, and process control IX : 20-22 February 1995, Santa Clara, California
Title of ser.:: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:: 2439
Pub. Year:: 1995
Page(from):: 353
Page(to):: 362
Pages:: 10
Pub. info.:: Bellingham, WA: Society of Photo-optical Instrumentation Engineers
ISSN:: 0277786X
ISBN:: 9780819417879 [0819417874]
Language:: English
Call no.:: P63600/2439
Type:: Conference Proceedings

Details

TDL ID:	ZA00057642
Series ID:	PA00000029
Conf. info. (Name):	Symposium on integrated circuit metrology, inspection, and process control
Conf. info. (Number):	9th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	1995.02.20-1995.02.22
Note for article:	9th Symposium on integrated circuit metrology, inspection, and process control, February 20-22, 1995, Santa Clara, CA, USA. 2439-35

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