High-resolution repair of photomasks using a deep-UV-laser-based defect repair system
- Author(s):
- Publication title:
- Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing V : 20-21 February 1995, Santa Clara, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 2437
- Pub. Year:
- 1995
- Page(from):
- 264
- Page(to):
- 275
- Pages:
- 12
- Pub. info.:
- Bellingham, WA: Society of Photo-optical Instrumentation Engineers
- ISSN:
- 0277786X
- ISBN:
- 9780819417855 [0819417858]
- Language:
- English
- Call no.:
- P63600/2437
- Type:
- Conference Proceedings
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