Resist contrast requirement for sub-0.25-µm lithography

Resist contrast requirement for sub-0.25-µm lithography

Author(s):

Publication title:

Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing V : 20-21 February 1995, Santa Clara, California

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

2437

Pub. Year:

1995

Page(from):

86

Page(to):

93

Pages:

8

Pub. info.:

Bellingham, WA: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819417855 [0819417858]

Language:

English

Call no.:

P63600/2437

Type:

Conference Proceedings

Details

TDL ID:	ZA00057640
Series ID:	PA00000029
Conf. info. (Name):	Symposium on electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing
Conf. info. (Number):	5th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	1995.02.20-1995.02.21
Note for article:	5th Symposium on electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing, February 20-21, 1995, Santa Clara, CA, USA. 2437-04

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