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Plasma-enhanced chemical vapor deposition of nitrogen-rich silicon oxynitride thin film for gate insulator application

Author(s):
Publication title:
Second International Conference on Thin Film Physics and Applications : '94 TFPA : 15-17 April 1994, Shanghai, China
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
2364
Pub. date:
1994
Page(from):
470
Page(to):
473
Pages:
4
Pub. info.:
Bellingham, WA: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819417084 [0819417084]
Language:
English
Call no.:
P63600/2364
Type:
Conference Proceedings

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