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Methods for parametric yield control for future 0.1-um deep submicron MOSFET manufacturing

Author(s):
Publication title:
Manufacturing process control for microelectronic devices and circuits : 20-21 October 1994, Austin, Texas
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
2336
Pub. Year:
1994
Page(from):
202
Page(to):
207
Pages:
6
Pub. info.:
Bellingham, WA: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819416698 [081941669X]
Language:
English
Call no.:
P63600/2336
Type:
Conference Proceedings

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