Optical proximity correction: a first look at manufacturability

Optical proximity correction: a first look at manufacturability

Author(s):

Publication title:

14th annual Symposium on Photomask Technology and Management : proceedings : 14-16 September 1994, Santa Clara, California

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

2322

Pub. Year:

1994

Page(from):

229

Page(to):

238

Pages:

10

Pub. info.:

Bellingham, WA: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819416537 [0819416533]

Language:

English

Call no.:

P63600/2322

Type:

Conference Proceedings

Details

TDL ID:	ZA00057525
Series ID:	PA00000029
Conf. info. (Name):	Annual Symposium on Photomask Technology and Management
Conf. info. (Number):	14th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	1994.09.14-1994.09.16
Note for article:	14th Annual Symposium on Photomask Technology and Management, September 14-16, 1994, Santa Clara, CA, USA. 2322-23

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