(574a) Invited Talk: Photochemical Reactions for Replicating and Aligning Block Copolymer Thin Film Patterns

(574a) Invited Talk: Photochemical Reactions for Replicating and Aligning Block Copolymer Thin Film Patterns

Author(s):

Publication title:

Materials Engineering and Sciences Division 2014 : Core Programming Area at the 2014 AIChE Annual Meeting : Atlanta, Georgia, USA, 16-21 November 2014

Title of ser.:

AIChE Conference Proceedings

Ser. no.:

2014

Pub. Year:

2014

Page(from):

738

Page(to):

738

Pages:

1

Pub. info.:

New York: American Institute of Chemical Engineers

ISBN:

9781510812642 [1510812644]

Language:

English

Call no.:

A08000/2014 [CD-ROM]

Type:

Conference Proceedings

Details

TDL ID:	ZA00061282
Series ID:	PA00000008
Conf. info. (Name):	AIChE Annual Meeting
Conf. info. (Number):	2014
Conf. info. (Venue):	Atlanta, GA, USA
Conf. info. (Date):	2014.11.16-2014.11.21
Note for article:	2014 AIChE Annual Meeting. Materials Engineering and Sciences Division 2014, Atlanta, Georgia, USA, 16-21 November 2014

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