Alexander M. Niziolek, Onur Onel, Josephine A. Elia, Richard C. Baliban, Xin Xiao
American Institute of Chemical Engineers
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Richard C. Baliban, Josephine A. Elia, Christodoulos A. Floudas
American Institute of Chemical Engineers
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Onur Onel, Alexander M. Niziolek, Josephine A. Elia, Richard C. Baliban, Christodoulos A. Floudas
American Institute of Chemical Engineers
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Richard C. Baliban, Josephine A. Elia, Christodoulos A. Floudas
American Institute of Chemical Engineers
|
Alexander M. Niziolek, Onur Onel, Josephine A. Elia, Richard C. Baliban, Christodoulos A. Floudas
American Institute of Chemical Engineers
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Richard C. Baliban, Josephine A. Elia, Christodoulos A. Floudas
American Institute of Chemical Engineers
|
Alexander M. Niziolek, Onur Onel, Christodoulos A. Floudas
American Institute of Chemical Engineers
|
Richard C. Baliban, Josephine A. Elia, Christodoulos A. Floudas
American Institute of Chemical Engineers
|
Alexander M. Niziolek, Onur Onel, Christodoulos A. Floudas
American Institute of Chemical Engineers
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Logan R. Matthews, Alexander M. Niziolek, Onur Onel, Neesha Pinnaduwage, Mark Holtzapple
American Institute of Chemical Engineers
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Richard C. Baliban, Josephine A. Elia, Christodoulos A. Floudas
American Institute of Chemical Engineers
|
Logan R. Matthews, Alexander M. Niziolek, Onur Onel, Neesha Pinnaduwage, Mark Holtzapple
American Institute of Chemical Engineers
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