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(250b) RF Plasmas for Thin Film Etching, Deposition, and Surface Modification

Author(s):
Dennis W. Hess  
Publication title:
Materials Engineering and Sciences Division 2013 : Core Programming Area at the 2013 AIChE Annual Meeting: Global Challenges for Engineering a Sustainable Future : San Francisco, California, USA, 3-8 November 2013
Title of ser.:
AIChE Conference Proceedings
Ser. no.:
2013
Pub. Year:
2013
Page(from):
302
Page(to):
302
Pages:
1
Pub. info.:
New York: American Institute of Chemical Engineers
ISBN:
9781634390460 [1634390466]
Language:
English
Call no.:
A08000/2013 [CD-ROM]
Type:
Conference Proceedings

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