Manasa Sridhar, Krishna Reddy Gunugunuri, Naiping Hu, Dale W. Schaefer, Stephen W. Thiel
American Institute of Chemical Engineers
|
Samuel St. John, Naiping Hu, Dale W. Schaefer, Anastasios Angelopoulos
American Institute of Chemical Engineers
|
Manasa Sridhar, Krishna Reddy Gunugunuri, Panagiotis Smirniotis, Neville G. Pinto
American Institute of Chemical Engineers
|
Rebecca J. Desch, JungSeung Kim, Stephen W. Thiel, Neville G. Pinto
American Institute of Chemical Engineers
|
Manasa Sridhar, Krishna Reddy Gunugunuri, Panagiotis Smirniotis, Neville G. Pinto
American Institute of Chemical Engineers
|
Rajesh Koirala, Krishna Reddy Gunugunuri, Panagiotis Smirniotis
American Institute of Chemical Engineers
|
Krishna Reddy Gunugunuri, Manasa Sridhar, Punit Boolchand, Panagiotis Smirniotis
American Institute of Chemical Engineers
|
Amina M. Darwish, Stephen W. Thiel
American Institute of Chemical Engineers
|
Krishna Reddy Gunugunuri, Manasa Sridhar, Punit Boolchand, Panagiotis Smirniotis
American Institute of Chemical Engineers
|
Ephraim Sheerin, Krishna Reddy Gunugunuri, Panagiotis Smirniotis
American Institute of Chemical Engineers
|
Krishna Reddy Gunugunuri, Juan He, Stephen W. Thiel, Panagiotis Smirniotis
American Institute of Chemical Engineers
|
Ephraim Sheerin, Krishna Reddy Gunugunuri, Panagiotis Smirniotis
American Institute of Chemical Engineers
|