(742d) 2-Step Plasma-Enhanced CVD for Low-Temperature Fabrication of Silica Membranes with High Gas-Separation Performance

(742d) 2-Step Plasma-Enhanced CVD for Low-Temperature Fabrication of Silica Membranes with High Gas-Separation Performance

Author(s):

Publication title:

2011 AIChE annual meeting, October 16-21, Minneapolis Convention Center, Minneapolis, MN : conference proceedings : Non-topical conferences

Title of ser.:

AIChE Conference Proceedings

Ser. no.:

P-267

Pub. Year:

2011

Pt.:

Separations Division

Pub. info.:

New York: American Institute of Chemical Engineers

ISBN:

9780816910700 [0816910707]

Language:

English

Call no.:

A08000/2011 [CD-ROM]

Type:

Conference Proceedings

Details

TDL ID:	ZA00061222
Series ID:	PA00000008
Conf. info. (Name):	AIChE annual meeting ; Particle Technology Forum ; North American Mixing Forum ; Computational Molecular Science and Engineering Forum ; Nanoscale Science and Engineering Forum ; Sustainable Engineering Forum ; Chemical Engineering & the Law Forum
Conf. info. (Number):	2011
Conf. info. (Venue):	Minneapolis, MN, USA
Conf. info. (Date):	2011.10.16-2011.10.21
Note for article:	[Html document] 2011 AIChE annual meeting, Minneapolis Convention Center, Minneapolis, MN, October 16-21, 2011. Separations Division (Paper231404)

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