(378e) First-Principles-Based Kinetic Modeling of Surface Growth During Plasma Deposition of Silicon Thin Films

(378e) First-Principles-Based Kinetic Modeling of Surface Growth During Plasma Deposition of Silicon Thin Films

Author(s):

Publication title:

Conference proceedings : 2009 AIChE annual meeting, Nashvikke, TN, November 8-13 : 09 AIChE annual meeting, Nashville, TN ; Non-topical conferences

Title of ser.:

AIChE Conference Proceedings

Ser. no.:

P-262

Pub. Year:

2009

Pt.:

8

Page(from):

160744

Pub. info.:

New York: American Institute of Chemical Engineers

ISBN:

9780816910586 [0816910588]

Language:

English

Call no.:

A08000/2009 [CD-ROM]

Type:

Conference Proceedings

Details

TDL ID:	ZA00061218
Series ID:	PA00000008
Conf. info. (Name):	AICheE Annual Meeting ; Particle Technology Forum ; North American Mixing Forum ; Computational Molecular Science and Engineering Forum ; Nanoscale Science and Engineering Forum ; Sustainable Engineering Forum
Conf. info. (Number):	2009
Conf. info. (Venue):	Nashvikke, TN, USA
Conf. info. (Date):	2009.11.08-2009.11.13
Note for article:	[HTML document] 2009 AICheE Annual Meeting, Nashville, TN, November 8-13. Materials Engineering and Sciences Division

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