Daniel Hallow, Justin Burt, Boguslaw Mudryk, Lucius Rossano, Srinivas Tummala
American Institute of Chemical Engineers
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Chenchi Wang, Truc Vu, Lucius Rossano
American Institute of Chemical Engineers
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Christopher L. Burcham, Joeseph R. Martinelli, Mark A. LaPack
American Institute of Chemical Engineers
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Chenchi Wang, Truc Vu, Lucius Rossano
American Institute of Chemical Engineers
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Stephen A. Guzikowski, James S. Bergum, Michael P. Cassidy, Chiajen J. Lai, Dong Lin
American Institute of Chemical Engineers
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Chenchi Wang, Truc Vu, Lucius Rossano
American Institute of Chemical Engineers
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Stephen A. Guzikowski, James S. Bergum, Michael P. Cassidy, Chiajen J. Lai, Dong Lin
American Institute of Chemical Engineers
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Alan Braem
American Institute of Chemical Engineers
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Nathaniel D. Kopp, Zhongmin Xu, James S. Bergum, Thomas L. Laporte, Jose E. Tabora
American Institute of Chemical Engineers
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Shawn Brueggemeier, Emily Reiff, Olav Lyngberg, Lindsay Hobson, Jose Tabora
American Institute of Chemical Engineers
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Nathaniel D. Kopp, Zhongmin Xu, James S. Bergum, Thomas L. Laporte, Jose E. Tabora
American Institute of Chemical Engineers
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Maria Sandoval, Lotfi Derdour, Saravanababu Murugesan, Christina Risatti, Alan Braem
American Institute of Chemical Engineers
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