A. Argoti, L. T. Fan, W. P. Walawender, S. T. Chou
American Institute of Chemical Engineers
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A. Argoti, L.T. Fan, W.P. Walawender, S.T. Chou
American Institute of Chemical Engineers
|
L.T. Fan, A. Argoti, S.T. Chou
American Institute of Chemical Engineers
|
A. Argoti, L.T. Fan, W.P. Walawender, S.T. Chou
American Institute of Chemical Engineers
|
A. Argoti, L.T. Fan, S.T. Chou
American Institute of Chemical Engineers
|
A. Argoti, L. T. Fan, W. P. Walawender, S. T. Chou
American Institute of Chemical Engineers
|
L.T. Fan, A. Argoti, S.T. Chou
American Institute of Chemical Engineers
|
Andres Argoti, L. T. Fan, S. T. Chou
American Institute of Chemical Engineers
|
Andres Argoti, L. T. Fan, Ronaldo G. Maghirang, S. T. Chou
American Institute of Chemical Engineers
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Deavin, L., Jarman, T. R., Lawson, C. J., Righelato, R. C., Slocombe, S.
American Chemical Society
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L.T. Fan, Andres Argoti, W.P. Walawender, S.T. Chou
American Institute of Chemical Engineers
|
A. Argoti, L.T. Fan, W.P. Walawender, S.T. Chou
American Institute of Chemical Engineers
|